DEVELOPMENT METHODS FOR SUB-MICRON OPTICAL LITHOGRAPHY

被引：5

作者：

ENDO, M

SASAGO, M

NAKAGAWA, H

UENO, A

NOMURA, N

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1989年 / 28卷 / 10期

关键词：

D O I：

10.1143/JJAP.28.2035

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2035 / 2037

页数：3

共 50 条

[1] SUB-MICRON OPTICAL LITHOGRAPHY
ROUSSEL, JM
PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1981, 275 : 9 - 16
[2] SUB-MICRON LITHOGRAPHY
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OPTICAL ENGINEERING, 1983, 22 (02) : 175 - 175
[3] OPTICAL PROJECTION LITHOGRAPHY IN THE SUB-MICRON RANGE
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[4] RESIST SCHEMES FOR SUB-MICRON OPTICAL LITHOGRAPHY
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[5] MASK BIAS IN SUB-MICRON OPTICAL LITHOGRAPHY
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[6] MULTILAYER RESIST TECHNIQUE FOR SUB-MICRON OPTICAL LITHOGRAPHY
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[7] SUB-MICRON OPTICAL LITHOGRAPHY USING INORGANIC RESISTS
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[8] DESIRE - A NEW ROUTE TO SUB-MICRON OPTICAL LITHOGRAPHY
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[9] CONTRAST ENHANCEMENT - A ROUTE TO SUB-MICRON OPTICAL LITHOGRAPHY
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[10] SUB-MICRON LITHOGRAPHY TECHNIQUES
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