DEVELOPMENT METHODS FOR SUB-MICRON OPTICAL LITHOGRAPHY

被引：5
|
作者：
ENDO, M
SASAGO, M
NAKAGAWA, H
UENO, A
NOMURA, N
机构：
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1989年 / 28卷 / 10期
关键词：
D O I：
10.1143/JJAP.28.2035
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：2035 / 2037
页数：3
相关论文
共 50 条
  • [41] Sub-micron lithography on proteins by room temperature transfer molding
    Pisignano, D
    Mazzeo, M
    Visconti, P
    Rinaldi, R
    Gigli, G
    Cingolani, R
    SYNTHETIC METALS, 2003, 137 (1-3) : 1483 - 1484
  • [42] A FOCUSED ION-BEAM SYSTEM FOR SUB-MICRON LITHOGRAPHY
    KURIHARA, K
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01): : 41 - 44
  • [43] X-RAY-SENSITIVE RESISTS FOR SUB-MICRON LITHOGRAPHY
    ALEKSANDROV, YM
    VALIEV, KA
    VELIKOV, LV
    GLEBOVA, OS
    GRIBOV, BS
    DUSHENKOV, SD
    MOZZHUKHIN, DD
    PLESHIVTSEV, AS
    SELIVANOV, GK
    YAKIMENKO, MN
    SOVIET MICROELECTRONICS, 1983, 12 (01): : 1 - 8
  • [44] X-RAY-LITHOGRAPHY BIDS FOR SUB-MICRON DOMINANCE
    LYMAN, J
    ELECTRONICS, 1985, 58 (48): : 45 - 46
  • [45] ELECTRON-BEAM OPTICAL-SYSTEM WITH LARGE FIELD COVERAGE FOR SUB-MICRON LITHOGRAPHY
    HOSOKAWA, T
    MORITA, H
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04): : 1293 - 1297
  • [46] Sub-micron pupillometry for optical EEG measurements
    Rohweder, Niels-Ole
    Gertheiss, Jan
    Rembe, Christian
    TM-TECHNISCHES MESSEN, 2021, 88 (7-8) : 473 - 480
  • [47] METHODOLOGY FOR SUB-MICRON DEVICE MODEL DEVELOPMENT
    MARASH, V
    DUTTON, RW
    IEEE TRANSACTIONS ON COMPUTER-AIDED DESIGN OF INTEGRATED CIRCUITS AND SYSTEMS, 1988, 7 (02) : 299 - 306
  • [48] SUB SUB-MICRON TURNING
    GETTELMAN, K
    MODERN MACHINE SHOP, 1984, 56 (11) : 50 - 55
  • [49] PATTERN FIDELITY IN SUB-MICRON LITHOGRAPHY WITH A RECTANGULAR ELECTRON-BEAM
    OKUBO, T
    TAKAMOTO, K
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1983, 22 (08): : 1335 - 1341
  • [50] AN INTENSE PLASMA X-RAY SOURCE FOR SUB-MICRON LITHOGRAPHY
    GUTCHECK, RA
    MURAY, JJ
    BERNSTEIN, MJ
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (03) : C113 - C113
12345