RESIST SCHEMES FOR SUB-MICRON OPTICAL LITHOGRAPHY

被引：0

作者：

COOPMANS, F

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来源：

JOURNAL DE PHYSIQUE | 1988年 / 49卷 / C-4期

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D O I：

10.1051/jphyscol:19884152

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引用

页码：723 / 734

页数：12

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[1] MULTILAYER RESIST TECHNIQUE FOR SUB-MICRON OPTICAL LITHOGRAPHY
TING, CH
LIAUW, KL
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04): : 1225 - 1234
[2] AN IMPROVED TRILEVEL RESIST SYSTEM FOR SUB-MICRON OPTICAL LITHOGRAPHY
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BENEKING, H
ARDEN, W
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[3] SUB-MICRON OPTICAL LITHOGRAPHY
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[4] SUB-MICRON OPTICAL LITHOGRAPHY UTILIZING A NEGATIVE DEEP UV RESIST MRS
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PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1985, 539 : 151 - 159
[5] APPLICATION OF GESE AS A DEEP UV RESIST FOR SUB-MICRON LITHOGRAPHY
ONG, E
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[6] SUB-MICRON OPTICAL LITHOGRAPHY USING AN INORGANIC RESIST-POLYMER BILEVEL SCHEME
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[7] SUB-MICRON LITHOGRAPHY
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OPTICAL ENGINEERING, 1983, 22 (02) : 175 - 175
[8] OPTICAL PROJECTION LITHOGRAPHY IN THE SUB-MICRON RANGE
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[9] DEVELOPMENT METHODS FOR SUB-MICRON OPTICAL LITHOGRAPHY
ENDO, M
SASAGO, M
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UENO, A
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JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1989, 28 (10): : 2035 - 2037
[10] MASK BIAS IN SUB-MICRON OPTICAL LITHOGRAPHY
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