Etching behavior of PbTe and Pb1 − xSnxTe crystal surfaces in aqueous H2O2-HBr-tartaric acid solutions

被引：0
|
作者：
G. P. Malanych
V. N. Tomashyk
I. B. Stratiychuk
Z. F. Tomashyk
机构：
[1] National Academy of Sciences of Ukraine,Lashkaryov Institute of Semiconductor Physics
来源：
Inorganic Materials | 2014年 / 50卷
关键词：
Dissolution Rate; Tartaric Acid; PbTe; Etch Rate; Hydrobromic Acid;
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学科分类号：
摘要：
The chemical polishing of the surface of single crystals of PbTe and Pb1 − xSnxTe solid solutions by H2O2-HBr-tartaric acid bromine-releasing etchants has been studied for the first time under reproducible hydrodynamic conditions. The dissolution rate of the crystals has been determined as a function of etchant composition, solution stirring rate, and temperature. The polished surfaces have been examined by microstructural analysis and electron microscopy. We have located the composition boundaries of solutions for the dynamic chemical polishing of the semiconductor materials studied.
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页码：661 / 666
页数：5
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