EFFECT OF THERMAL NITRIDATION PROCESSES ON BORON AND PHOSPHORUS DIFFUSION IN (100) SILICON

被引：72
|
作者：
FAHEY, P
DUTTON, RW
MOSLEHI, M
机构：
来源：
APPLIED PHYSICS LETTERS | 1983年 / 43卷 / 07期
关键词：
D O I：
10.1063/1.94445
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
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页码：683 / 685
页数：3
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