Oxynitridation-enhanced diffusion of phosphorus in 〈100〉 silicon

被引：0

作者：

Chen, N.K. ^{[1
]}

Lee, Chiapyng ^{[1
]}

机构：

[1] Natl Taiwan Inst of Technology, Taipei, Taiwan

来源：

Journal of the Electrochemical Society | 1995年 / 142卷 / 06期

关键词：

537.1 Heat Treatment Processes - 549.3 Others; including Bismuth; Boron; Cadmium; Cobalt; Mercury; Niobium; Selenium; Silicon; Tellurium and Zirconium - 802.3 Chemical Operations - 804 Chemical Products Generally - 804.2 Inorganic Compounds - 931.1 Mechanics;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

页码：2051 / 2054

共 50 条

[1] OXYNITRIDATION-ENHANCED DIFFUSION OF PHOSPHORUS IN [100] SILICON
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