Oxynitridation-enhanced diffusion of phosphorus in 〈100〉 silicon

被引：0
|
作者：
Chen, N.K. [1 ]
Lee, Chiapyng [1 ]
机构：
[1] Natl Taiwan Inst of Technology, Taipei, Taiwan
来源：
Journal of the Electrochemical Society | 1995年 / 142卷 / 06期
关键词：
537.1 Heat Treatment Processes - 549.3 Others; including Bismuth; Boron; Cadmium; Cobalt; Mercury; Niobium; Selenium; Silicon; Tellurium and Zirconium - 802.3 Chemical Operations - 804 Chemical Products Generally - 804.2 Inorganic Compounds - 931.1 Mechanics;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
14
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页码：2051 / 2054
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