VARIATION IN THE STOICHIOMETRY OF THIN SILICON-NITRIDE INSULATING FILMS ON SILICON AND ITS CORRELATION WITH MEMORY TRAPS

被引：34
|
作者：
BAILEY, RS
KAPOOR, VJ
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1982年 / 20卷 / 03期
关键词：
D O I：
10.1116/1.571341
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：484 / 487
页数：4
相关论文
共 50 条
  • [41] DIELECTRIC-RELAXATION AND CHARGING AND L/F FLICKER VOLTAGE NOISE IN SILICON-NITRIDE THIN INSULATING FILMS
    SIEGEL, E
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (03) : C101 - C102
  • [42] REVIEW OF SILICON-NITRIDE AND OXYNITRIDE FILMS FOR NONVOLATILE MEMORY DEVICE TECHNOLOGY
    KAPOOR, VJ
    XU, D
    TURI, RA
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1988, 135 (08) : C361 - C361
  • [43] THERMAL-OXIDATION OF SILICON-NITRIDE AND SILICON OXYNITRIDE FILMS
    KUIPER, AET
    WILLEMSEN, MFC
    MULDER, JML
    ELFERINK, JBO
    HABRAKEN, FHPM
    VANDERWEG, WF
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (03): : 455 - 465
  • [44] MICROWAVE GLOW-DISCHARGE DEPOSITION OF THIN SILICON-NITRIDE FILMS
    RUZICKA, M
    CZECHOSLOVAK JOURNAL OF PHYSICS, 1974, B 24 (04) : 465 - 468
  • [45] Hydrogenated silicon-nitride thin films as antireflection and passivation coatings for multicrystalline silicon solar cells
    Kim, Kyunghae
    Dhungel, S. K.
    Yoo, J.
    Jung, Sungwook
    Mangalaraj, D.
    Yi, Junsin
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2007, 51 (05) : 1659 - 1662
  • [46] TIME CHARACTERISTICS OF BREAKDOWN IN FILMS OF SILICON DIOXIDE AND SILICON-NITRIDE
    SHMIDT, TV
    GURTOV, VA
    LALEKO, VA
    SOVIET MICROELECTRONICS, 1988, 17 (03): : 139 - 143
  • [47] PROPERTIES OF SILICON-NITRIDE THIN-FILMS OBTAINED BY REACTIVE SPUTTERING
    POSADOWSKI, W
    THIN SOLID FILMS, 1980, 69 (02) : 149 - 155
  • [48] DEPOSITION RATE MEASUREMENTS OF SILICON, SILICON DIOXIDE AND SILICON-NITRIDE FILMS ON SILICON SUBSTRATES
    MOROSANU, CE
    SEGAL, E
    REVUE ROUMAINE DE CHIMIE, 1979, 24 (01) : 105 - 111
  • [49] INTERFACE INSTABILITY OF RF SPUTTERED SILICON-NITRIDE FILMS ON SILICON
    CHEN, PCY
    THIN SOLID FILMS, 1974, 21 (02) : 245 - 253
  • [50] RELAXATIONAL POLARIZATION AND CHARGE INJECTION IN THIN-FILMS OF SILICON-NITRIDE
    HOMANN, M
    KLIEM, H
    MICROELECTRONICS JOURNAL, 1994, 25 (07) : 559 - 566
12345