MICROWAVE GLOW-DISCHARGE DEPOSITION OF THIN SILICON-NITRIDE FILMS

被引:0
|
作者
RUZICKA, M [1 ]
机构
[1] UNIV JE PURKYNE, FAC SCI, DEPT EXPTL PHYS, KOTLARSKA 2, 61137 BRNO, CZECHOSLOVAKIA
关键词
D O I
10.1007/BF01594082
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
引用
收藏
页码:465 / 468
页数:4
相关论文
共 50 条
  • [1] DEPOSITION OF SILICON-NITRIDE FILMS BY MICROWAVE GLOW-DISCHARGE
    SHIMA, Y
    MIYAZAKI, T
    NAKAMURA, N
    ADACHI, E
    TOKUYAMA, T
    JAPANESE JOURNAL OF APPLIED PHYSICS, 1973, 12 (02) : 309 - 310
  • [2] CHARACTERIZATION OF SILICON-NITRIDE FILMS FORMED IN AN RF GLOW-DISCHARGE
    MURAKAMI, K
    TAKEUCHI, T
    ISHIKAWA, K
    YAMAMOTO, T
    APPLIED SURFACE SCIENCE, 1988, 33-4 : 742 - 749
  • [3] ODMR IN GLOW-DISCHARGE DEPOSITED SILICON-NITRIDE
    LOWE, AJ
    CAVENETT, BC
    HOMEWOOD, KP
    POWELL, MJ
    ELLIOTT, SR
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1985, 77-8 : 735 - 738
  • [4] GLOW-DISCHARGE SYNTHESIS OF SILICON-NITRIDE PRECURSOR POWDERS
    HO, P
    BUSS, RJ
    LOEHMAN, RE
    JOURNAL OF MATERIALS RESEARCH, 1989, 4 (04) : 873 - 881
  • [5] THE EFFECT OF GLOW-DISCHARGE CHARACTERISTICS ON THE PROPERTIES OF PLASMA-CVD SILICON-NITRIDE FILMS
    HIRAIWA, A
    MUKAI, K
    TAKAHASHI, S
    HARADA, S
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (03) : C104 - C105
  • [6] PRODUCTION OF SILICON-NITRIDE FILMS FROM HEXAMETHYLCYCLOTRISILAZANE IN A HIGH-FREQUENCY GLOW-DISCHARGE
    VORONKOV, MG
    SULIMIN, AD
    IACHMENEV, VV
    MIRSKOV, RG
    KOKIN, VN
    CHERNOVA, VG
    DOKLADY AKADEMII NAUK SSSR, 1981, 259 (05): : 1130 - 1132
  • [7] DEPOSITION OF SILICON-NITRIDE BY GLOW-DISCHARGE DECOMPOSITION OF SILANE NITROGEN MIXTURES IN A SADDLE-FIELD PLASMA
    UKAH, CI
    MEH, R
    ZUKOTYNSKI, S
    KRUZELECKY, RV
    CHAKRABARTI, A
    CANADIAN JOURNAL OF PHYSICS, 1991, 69 (3-4) : 185 - 191
  • [8] Optical transmission measurements on glow-discharge amorphous silicon nitride films
    Ay, I.
    Tolunay, H.
    2001, TUBITAK (25):
  • [9] GLOW-DISCHARGE DEPOSITION OF TETRAMETHYLSILANE FILMS
    CATHERINE, Y
    ZAMOUCHE, A
    PLASMA CHEMISTRY AND PLASMA PROCESSING, 1985, 5 (04) : 353 - 368
  • [10] SOME PROPERTIES OF THIN ALUMINUM NITRIDE FILMS FORMED IN A GLOW-DISCHARGE
    UEMURA, Y
    TANAKA, K
    IWATA, M
    THIN SOLID FILMS, 1974, 20 (01) : 11 - 16