VARIATION IN THE STOICHIOMETRY OF THIN SILICON-NITRIDE INSULATING FILMS ON SILICON AND ITS CORRELATION WITH MEMORY TRAPS

被引：34
|
作者：
BAILEY, RS
KAPOOR, VJ
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1982年 / 20卷 / 03期
关键词：
D O I：
10.1116/1.571341
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：484 / 487
页数：4
相关论文
共 50 条
  • [21] CREATION OF SILICON-NITRIDE FILMS ON SILICON DURING IMPLANTATION
    ALEKSANDROV, PA
    BARANOVA, EK
    BUDARAGIN, VV
    DEMAKOV, KD
    KOTOV, EV
    SHEMARDOV, SG
    INSTRUMENTS AND EXPERIMENTAL TECHNIQUES, 1991, 34 (04) : 972 - 973
  • [22] INVESTIGATIONS ON ULTRATHIN SILICON-NITRIDE AND SILICON DIOXIDE FILMS IN NONVOLATILE SEMICONDUCTOR MEMORY TRANSISTORS
    ROY, A
    LIBSCH, FR
    WHITE, MH
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1986, 133 (08) : C316 - C316
  • [23] DENSITY OF AS-DEPOSITED AND ANNEALED THIN SILICON-NITRIDE FILMS
    BRUYERE, JC
    SAVALL, C
    REYNES, B
    BRUNEL, M
    ORTEGA, L
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1993, 26 (04) : 713 - 716
  • [24] PREPARATION, CHARACTERIZATION AND APPLICATIONS OF SILICON-NITRIDE THIN-FILMS
    MOROSANU, CE
    THIN SOLID FILMS, 1980, 65 (02) : 171 - 208
  • [25] THE ZETA-POTENTIAL OF SILICON-NITRIDE THIN-FILMS
    BOUSSE, L
    MOSTARSHED, S
    JOURNAL OF ELECTROANALYTICAL CHEMISTRY, 1991, 302 (1-2): : 269 - 274
  • [26] SILICON-NITRIDE FILMS ON SILICON FOR OPTICAL-WAVEGUIDES
    STUTIUS, W
    STREIFER, W
    APPLIED OPTICS, 1977, 16 (12): : 3218 - 3222
  • [27] SUCCESSIVE DETERMINATION OF SILICON AND NITROGEN IN SILICON-NITRIDE FILMS
    HAYASHI, M
    KITAZUME, E
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1979, (APR): : 232 - 232
  • [28] DETERMINATION OF SILICON AND NITROGEN IN SEMICONDUCTOR SILICON-NITRIDE FILMS
    KITAZUME, E
    USAMI, K
    MATERIALS TRANSACTIONS JIM, 1989, 30 (03): : 184 - 187
  • [29] THE ROLE OF HYDROGEN IN SILICON-NITRIDE AND SILICON OXYNITRIDE FILMS
    SCHALCH, D
    SCHARMANN, A
    WOLFRAT, R
    THIN SOLID FILMS, 1985, 124 (3-4) : 301 - 308
  • [30] ELECTRON HEATING IN SILICON-NITRIDE AND SILICON OXYNITRIDE FILMS
    DIMARIA, DJ
    ABERNATHEY, JR
    JOURNAL OF APPLIED PHYSICS, 1986, 60 (05) : 1727 - 1729
12345