Temperature Dependences of the Sputtering of Negative Silicon Cluster Ions

被引：0
|
作者：
B. G. Atabaev
R. Dzabbarganov
F. R. Yuzikaeva
M. A. Permukhamedova
Z. Sh. Shaymardanov
A. S. Khalmatov
机构：
[1] Arifov Institute of Ion-Plasma and Laser Technologies,
[2] Academy of Sciences of Uzbekistan,undefined
来源：
Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques | 2023年 / 17卷
关键词：
sputtering; secondary-ion mass spectrometry; cluster; silicon; emission; negative ion; energy threshold;
D O I：
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中图分类号：
学科分类号：
摘要：
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页码：S413 / S415
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