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- [9] Multi-layer resist system for 45nm-node and beyond (III) PHOTOMASK TECHNOLOGY 2006, PTS 1 AND 2, 2006, 6349
- [10] Direct plating of cu on ALD TaN for 45nm-node cu BEOL metallization IEEE INTERNATIONAL ELECTRON DEVICES MEETING 2004, TECHNICAL DIGEST, 2004, : 337 - 340