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- [38] Physical characterization challenges in 45 nm technology node IPFA 2008: PROCEEDINGS OF THE 15TH INTERNATIONAL SYMPOSIUM ON THE PHYSICAL & FAILURE ANALYSIS OF INTEGRATED CIRCUITS, 2008, : 275 - 278
- [39] The specification of the 45 nm node Photomask repair process PHOTOMASK TECHNOLOGY 2006, PTS 1 AND 2, 2006, 6349
- [40] Litho/Design Co-optimization and Area Scaling for the 22-nm Logic Node CHINA SEMICONDUCTOR TECHNOLOGY INTERNATIONAL CONFERENCE 2010 (CSTIC 2010), 2010, 27 (01): : 449 - 454