Polymerization of fluorocarbons in reactive ion etching plasmas

被引:0
|
作者
机构
来源
J Vac Sci Technol A | / 1卷 / 87期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [21] FLUOROCARBON PLASMAS WITH SIMULTANEOUS ETCHING AND POLYMERIZATION
    KAY, E
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1982, 184 (SEP): : 70 - ORPL
  • [22] MAGNETRON REACTIVE ION ETCHING OF ALN AND INN IN BCL3 PLASMAS
    MCLANE, GF
    CASAS, L
    LAREAU, RT
    ECKART, DW
    VARTULI, CB
    PEARTON, SJ
    ABERNATHY, CR
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1995, 13 (03): : 724 - 726
  • [23] REACTIVE ION ETCHING LAG INVESTIGATION OF OXIDE ETCHING IN FLUOROCARBON ELECTRON-CYCLOTRON-RESONANCE PLASMAS
    JOUBERT, O
    OEHRLEIN, GS
    SURENDRA, M
    ZHANG, Y
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1994, 12 (04): : 1957 - 1961
  • [24] TUNGSTEN ETCHING MECHANISMS IN CF4/O-2 REACTIVE ION ETCHING PLASMAS
    BESTWICK, TD
    OEHRLEIN, GS
    JOURNAL OF APPLIED PHYSICS, 1989, 66 (10) : 5034 - 5038
  • [25] REACTIVE ION ETCHING OF SIGE ALLOYS USING FLUORINE-CONTAINING PLASMAS
    ZHANG, Y
    OEHRLEIN, GS
    DEFRESART, E
    CORBETT, JW
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1993, 11 (05): : 2492 - 2495
  • [26] PLASMA CHEMISTRY OF FLUOROCARBONS AS RELATED TO PLASMA-ETCHING AND PLASMA POLYMERIZATION
    KAY, E
    COBURN, J
    DILKS, A
    TOPICS IN CURRENT CHEMISTRY, 1980, 94 : 1 - 42
  • [27] REACTIVE ION ETCHING
    ZIELINSKI, L
    SCHWARTZ, GC
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (03) : C71 - C71
  • [28] Effect of Hydrogen Ion Energy in the Process of Reactive Ion Etching of Sn Thin Films by Hydrogen Plasmas
    Ji, Mengran
    Nagata, Ryo
    Uchino, Kiichiro
    PLASMA AND FUSION RESEARCH, 2021, 16 : 1406003 - 1
  • [29] Reactive ion etching of GaN in BCl3/N-2 plasmas
    Fedison, JB
    Chow, TP
    Lu, H
    Bhat, IB
    PROCEEDINGS OF THE FIRST SYMPOSIUM ON III-V NITRIDE MATERIALS AND PROCESSES, 1996, 96 (11): : 168 - 179
  • [30] Highly chemical reactive ion etching of silicon in CF4 containing plasmas
    Rosli, Siti Azlina
    Aziz, Azlan Abdul
    Hamid, Haslinda Abdul
    2006 IEEE INTERNATIONAL CONFERENCE ON SEMICONDUCTOR ELECTRONICS, PROCEEDINGS, 2006, : 856 - +