Particle removal from semiconductor wafers by megasonic cleaning

被引：0
|
作者：
Kuehn, T.H. [1 ]
Kittelson, D.B. [1 ]
Wu, Y. [1 ]
Gouk, R. [1 ]
机构：
[1] Univ of Minnesota, Minneapolis, MN, United States
来源：
| / Pergamon Press Inc, Tarrytown卷 / 27期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [41] Evaluation of megasonic cleaning processes
    Holsteyns, F
    Riskin, A
    Vereecke, G
    Maes, A
    Mertens, PM
    CLEANING TECHNOLOGY IN SEMICONDUCTOR DEVICE MANUFACTURING VIII, 2004, 2003 (26): : 161 - 167
  • [42] Development of a Single-Beam Megasonic System for Nano-Particle Cleaning
    Kim, Hyunse
    Lee, Yanglae
    Lim, Euisu
    CLEANING AND SURFACE CONDITIONING TECHNOLOGY IN SEMICONDUCTOR DEVICE MANUFACTURING 11, 2009, 25 (05): : 281 - 286
  • [43] Particle removal mechanism of hydrogenated ultrapure water with megasonic irradiation
    Morita, H
    Ida, J
    Ota, O
    Tsukamoto, K
    Ohmi, T
    ULTRA CLEAN PROCESSING OF SILICON SURFACES 2000, 2001, 76-77 : 245 - 249
  • [44] Ensuring the effectiveness of megasonic cleaning
    JOT, Journal fuer Oberflaechentechnik, 2024, 64 (11): : 38 - 41
  • [45] Influence of hardware and chemistry on the removal of nano-particles in a megasonic cleaning tank
    Vereecke, G
    Vos, R
    Holsteyns, F
    Schmidt, MO
    Baeyens, M
    Gomme, S
    Snow, J
    Coenen, V
    Mertens, PW
    Bauer, T
    Heyns, MM
    ULTRA CLEAN PROCESSING OF SILICON SURFACES V, 2003, 92 : 143 - 146
  • [46] Experimental study of particle deposition on semiconductor wafers
    Pui, D.Y.H.
    Ye, Y.
    Liu, B.Y.H.
    Aerosol Science and Technology, 1990, 12 (04): : 795 - 804
  • [47] Megasonic Cleaning: Effect of dissolved gas properties on cleaning
    Shende, Hrishi
    Singh, Sherjang
    Baugh, James
    Dietze, Uwe
    Dress, Peter
    PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XX, 2013, 8701
  • [48] Second-order sound field during megasonic cleaning of patterned silicon wafers: Application to ridges and trenches
    Deymier, PA
    Vasseur, JO
    Khelif, A
    Raghavan, S
    JOURNAL OF APPLIED PHYSICS, 2001, 90 (08) : 4211 - 4218
  • [49] Effects of size, humidity, and aging on particle removal from Si wafers
    Kim, Tae-Gon
    Yoo, Young-Sam
    Lee, Seung-Ho
    Park, Jin-Goo
    MICROELECTRONIC ENGINEERING, 2009, 86 (02) : 145 - 149
  • [50] A Multi-frequency Megasonic System for Nano-particle Removal
    Kim, Hyunse
    Lee, Yanglae
    Lim, Euisu
    SEMICONDUCTOR CLEANING SCIENCE AND TECHNOLOGY 13 (SCST 13), 2013, 58 (06): : 29 - 35
12345