Particle removal from semiconductor wafers by megasonic cleaning

被引：0
|
作者：
Kuehn, T.H. [1 ]
Kittelson, D.B. [1 ]
Wu, Y. [1 ]
Gouk, R. [1 ]
机构：
[1] Univ of Minnesota, Minneapolis, MN, United States
来源：
| / Pergamon Press Inc, Tarrytown卷 / 27期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [21] Non-contact Post-CMP megasonic cleaning of cobalt wafers
    Zhang, Lifei
    Lu, Xinchun
    Busnaina, Ahmed A.
    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2023, 156
  • [22] Ex situ bubble generation, enhancing the particle removal rate for single wafer megasonic cleaning processes
    Holsteyns, Frank
    Janssens, Tom
    Arnauts, Sophia
    Van de Putte, Wouter
    Minsier, Vincent
    Brunner, Johann
    Straka, Joachim
    Mertens, Paul W.
    ULTRA CLEAN PROCESSING OF SEMICONDUCTOR SURFACES VIII, 2008, 134 : 201 - +
  • [23] Particle deposition and removal in wet cleaning processes for semiconductor manufacturing
    Itano, M
    Kezuka, T
    Kubo, M
    Ohmi, T
    1996 SEMICONDUCTOR PURE WATER AND CHEMICALS CONFERENCE, PTS 1 AND 2: PT 1: UPW & CHEMICAL PROCEEDINGS; PT 2: UPW RECLAIM PROCEEDINGS, 1996, : A257 - A287
  • [24] The suitability of ultrasonic and megasonic cleaning of nanoscale patterns in ammonia hydroxide solutions for particle removal and feature damage
    Chu, Chun-Lin
    Lu, Te-Yun
    Fuh, Yiin-Kuen
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2020, 35 (04)
  • [25] Particle deposition and removal from Ge wafers
    Sioncke, Sonja
    Lux, Marcel
    Fyen, Wim
    Meuris, Marc
    Mertens, Paul
    Theuwis, Antoon
    ULTRA CLEAN PROCESSING OF SEMICONDUCTOR SURFACES VIII, 2008, 134 : 173 - +
  • [26] PARTICLE DEPOSITION ON SEMICONDUCTOR WAFERS
    LIU, BYH
    AHN, KH
    AEROSOL SCIENCE AND TECHNOLOGY, 1987, 6 (03) : 215 - 224
  • [27] Laser removal of foreign materials from semiconductor wafers
    Genut, M
    Livshits, B
    Uziel, Y
    Tehar-Zahav, O
    Iskevitch, E
    Barzilay, I
    Speiser, S
    LASER APPLICATIONS IN MICROELECTRONIC AND OPTOELECTRONIC MANUFACTURING III, 1998, 3274 : 90 - 99
  • [28] Simulation of acoustic field for megasonic bath cleaning in advanced semiconductor manufacturing
    Huang, Yating
    Dong, Xiuping
    MICRO MANUFACTURING TECHNIQUES AND APPLICATIONS, 2013, 289 : 81 - 86
  • [29] Megasonic Cleaning of Blanket and Patterned Samples in Carbonated Ammonia Solutions for Enhanced Particle Removal and Reduced Feature Damage
    Han, Zhenxing
    Keswani, Manish
    Raghavan, Srini
    IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2013, 26 (03) : 400 - 405
  • [30] Acoustic field analysis of a T type waveguide in single wafer megasonic cleaning and its effect on particle removal
    Lee, Yanglae
    Lim, Euisu
    Kang, Kookjin
    Kim, Hyunse
    Kim, Tae-Gon
    Lee, Sang-Ho
    Park, Jin-Goo
    ULTRA CLEAN PROCESSING OF SEMICONDUCTOR SURFACES VIII, 2008, 134 : 229 - +
12345