OPTICAL SPECTROSCOPY IN REACTIVE SPUTTER ETCHING AND ITS APPLICATION TO PROCESS-CONTROL

被引：8
|
作者：
OSHIMA, M
机构：
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS | 1981年 / 20卷 / 04期
关键词：
D O I：
10.1143/JJAP.20.683
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
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页码：683 / 690
页数：8
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