Micromachining of optical fiber using reactive ion etching and its application

被引：2
|
作者：
Kumazaki, H [1 ]
Yamada, Y [1 ]
Oshima, T [1 ]
Inaba, S [1 ]
Hane, K [1 ]
机构：
[1] Gifu Natl Coll Technol, Dept Elect Engn, Gifu, Japan
来源：
MICROPROCESSES AND NANOTECHNOLOGY 2000, DIGEST OF PAPERS | 2000年
关键词：
D O I：
10.1109/IMNC.2000.872672
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：154 / 155
页数：2
相关论文
共 50 条
  • [1] Micromachining of optical fiber using reactive ion etching and its application
    Kumazaki, H
    Yamada, Y
    Oshima, T
    Inaba, S
    Hane, K
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2000, 39 (12B): : 7142 - 7144
  • [2] Micromachining of optical fiber using reactive ion etching and its application
    Kumazaki, Hironori, 2000, (39):
  • [3] REACTIVE ION ETCHING (RIE) TECHNIQUES FOR MICROMACHINING APPLICATIONS
    LI, YX
    WOLFFENBUTTEL, MR
    FRENCH, PJ
    LAROS, M
    SARRO, PM
    WOLFFENBUTTEL, RF
    SENSORS AND ACTUATORS A-PHYSICAL, 1994, 41 (1-3) : 317 - 323
  • [4] REACTIVE ION BEAM ETCHING AND ITS APPLICATION.
    Jin Weixin
    Meng Xianguang
    You Dawei
    Xu Xingcai
    Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors, 1983, 4 (01): : 97 - 100
  • [5] BULK MICROMACHINING OF SI BY LITHOGRAPHY AND REACTIVE ION ETCHING (LIRIE)
    RANGELOW, IW
    HUDEK, P
    SHI, F
    VACUUM, 1995, 46 (12) : 1361 - 1369
  • [6] Reactive ion etching for high aspect ratio silicon micromachining
    Rangelow, IW
    SURFACE & COATINGS TECHNOLOGY, 1997, 97 (1-3): : 140 - 150
  • [7] Bulk micromachining of polycrystalline SiC using Si molds fabricated by Deep Reactive Ion Etching
    Rajan, N.
    Zorman, C.A.
    Mehregany, M.
    Materials Science Forum, 2000, 338
  • [8] A novel isolation technology in bulk micromachining using deep reactive ion etching and a polysilicon refill
    Zhang, DC
    Li, ZH
    Li, T
    Wu, GY
    JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 2001, 11 (01) : 13 - 19
  • [9] Bulk micromachining of polycrystalline SiC using Si molds fabricated by deep reactive ion etching
    Rajan, N
    Zorman, CA
    Mehregany, M
    SILICON CARBIDE AND RELATED MATERIALS - 1999 PTS, 1 & 2, 2000, 338-3 : 1145 - 1148
  • [10] Vertical mirrors fabricated by reactive ion etching for fiber optical switching applications
    Marxer, C
    Gretillat, MA
    deRooij, NF
    Battig, R
    Anthamatten, O
    Valk, B
    Vogel, P
    MEMS 97, PROCEEDINGS - IEEE THE TENTH ANNUAL INTERNATIONAL WORKSHOP ON MICRO ELECTRO MECHANICAL SYSTEMS: AN INVESTIGATION OF MICRO STRUCTURES, SENSORS, ACTUATORS, MACHINES AND ROBOTS, 1997, : 49 - 54
12345