OPTICAL SPECTROSCOPY IN REACTIVE SPUTTER ETCHING AND ITS APPLICATION TO PROCESS-CONTROL

被引：8

|

作者：

OSHIMA, M

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1981年 / 20卷 / 04期

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D O I：

10.1143/JJAP.20.683

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：683 / 690

页数：8

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