POSITIVE PHOTORESIST DEVELOPMENT - A MULTIPLE STATE PERCOLATION MODEL

被引：0
|
作者：
TREFONAS, P
机构：
来源：
ADVANCES IN RESIST TECHNOLOGY AND PROCESSING VI | 1989年 / 1086卷
关键词：
D O I：
暂无
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
引用
收藏
页码：484 / 494
页数：11
相关论文
共 50 条
  • [11] The optimized model of multiple invasion percolation
    Zara, RA
    Onody, RN
    INTERNATIONAL JOURNAL OF MODERN PHYSICS C, 1999, 10 (01): : 227 - 232
  • [12] SIMULTANEOUS EXPOSURE AND DEVELOPMENT TECHNIQUE FOR MAKING GRATINGS ON POSITIVE PHOTORESIST
    TSANG, WT
    WANG, S
    APPLIED PHYSICS LETTERS, 1974, 24 (04) : 196 - 199
  • [13] Thick film positive photoresist: development and resolution enhancement technique
    McKean, Dennis R.
    Russell, Thomas P.
    Hinsberg, William D.
    Hofer, Don
    Renaldo, Alfred F.
    Grant Wilson, C.
    Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 1995, 13 (06): : 3000 - 3006
  • [14] Thick film positive photoresist: Development and resolution enhancement technique
    McKean, DR
    Russell, TP
    Hinsberg, WD
    Hofer, D
    Renaldo, AF
    Willson, CG
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1995, 13 (06): : 3000 - 3006
  • [15] POSITIVE PHOTORESIST MATERIALS
    LEVINE, HA
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1969, (APR): : PO59 - &
  • [16] A stochastic photoresist-polymer dissolution model combining the percolation and critical ionization models
    Sarris, V.
    Patsis, G.P.
    Constantoudis, V.
    Boudouvis, A.G.
    Gogolides, E.
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2005, 44 (10): : 7400 - 7403
  • [17] A stochastic photoresist-polymer dissolution model combining the percolation and critical ionization models
    Sarris, V
    Patsis, GP
    Constantoudis, V
    Boudouvis, AG
    Gogolides, E
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2005, 44 (10): : 7400 - 7403
  • [18] A NEW POSITIVE PHOTORESIST
    WEIGERT, FJ
    PROSKOW, S
    JOURNAL OF IMAGING SCIENCE, 1987, 31 (01): : 11 - 14
  • [19] CHARACTERIZATION OF POSITIVE PHOTORESIST
    DILL, FH
    HORNBERGER, WP
    HAUGE, PS
    SHAW, JM
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) : 445 - 452
  • [20] AN IMPROVED POSITIVE PHOTORESIST
    WEIGERT, FJ
    PROSKOW, S
    MITCHELL, RS
    JOURNAL OF IMAGING SCIENCE, 1987, 31 (05): : 223 - 225
12345