A stochastic photoresist-polymer dissolution model combining the percolation and critical ionization models

被引：0
|
作者：
Sarris, V. [1 ]
Patsis, G.P. [1 ]
Constantoudis, V. [1 ]
Boudouvis, A.G. [2 ]
Gogolides, E. [1 ]
机构：
[1] Institute of Microelectronics, NCSR Demokritos, PO Box 60228, Aghia Paraskevi, Attiki, Greece
[2] School of Chemical Engineering, National Technical University of Athens, Zografou Campus, 15780, Greece
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 2005年 / 44卷 / 10期
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摘要：
16
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页码：7400 / 7403
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