MICROANALYSES OF TANTALUM OXIDE-FILMS ON SI SUBSTRATE DEPOSITED BY DYNAMIC ION-BEAM MIXING

被引：0
|
作者：
HUANG, NK
WANG, DZ
机构：
[1] Institute of Nuclear Science and Technology, Sichuan University, Chengdu
来源：
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1995年 / 147卷 / 02期
关键词：
D O I：
10.1002/pssa.2211470240
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
[No abstract available]
引用
收藏
页码：K83 / K85
页数：3
相关论文
共 50 条
  • [31] RARE-GAS INCORPORATION IN ION-BEAM SPUTTERING DEPOSITED SI FILMS
    SCHWEBEL, G
    PELLET, C
    GAUTHERIN, G
    VACUUM, 1986, 36 (11-12) : 1020 - 1020
  • [32] Ion-beam analysis of phospholipid thin films deposited on c-Si
    Som, T
    Khan, TK
    Gupta-Bhaya, P
    Kumar, S
    Kulkarni, VN
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1999, 159 (1-2): : 67 - 74
  • [33] ION-BEAM MIXING MODIFICATION OF SPUTTER-DEPOSITED MOLYBDENUM FILMS ON SI3N4 CERAMICS
    BAI, MW
    ZHANG, XS
    THIN SOLID FILMS, 1994, 249 (02) : 183 - 186
  • [34] Ion-beam reduction of the surface of tantalum higher oxide
    N. V. Alov
    D. M. Kutsko
    Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques, 2011, 5 : 259 - 262
  • [35] Ion-beam reduction of the surface of tantalum higher oxide
    Alov, N. V.
    Kutsko, D. M.
    JOURNAL OF SURFACE INVESTIGATION-X-RAY SYNCHROTRON AND NEUTRON TECHNIQUES, 2011, 5 (02) : 259 - 262
  • [36] ION MONITORING OF ION-BEAM DYNAMIC MIXING PROCESS
    CHAYAHARA, A
    KIUCHI, M
    MOKUNO, Y
    HORINO, Y
    FUJII, K
    SATOU, M
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1993, 80-1 : 124 - 127
  • [37] Resistance repeatability study of ion-beam deposited vanadium oxide thin films
    Alvarez, P.
    Pearson, D. I. C.
    Pochon, S.
    Thomas, O.
    Cooke, M.
    Gunn, Robert
    INFRARED SENSORS, DEVICES, AND APPLICATIONS VI, 2016, 9974
  • [38] PT4SI9 FORMATION BY HOT SUBSTRATE ION-BEAM MIXING
    HUNG, LS
    HONG, QZ
    MAYER, JW
    JOURNAL OF APPLIED PHYSICS, 1988, 63 (09) : 4651 - 4654
  • [39] Ion-beam mixing - Does it depend on the substrate thickness?
    Kopcewicz, M
    Jagielski, J
    Grabias, A
    Stobiecki, F
    Szymanski, B
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1997, 127 : 141 - 144
  • [40] Ion-beam mixing - does it depend on the substrate thickness?
    Inst of Electronic Materials, Technology, Warszawa, Poland
    Nucl Instrum Methods Phys Res Sect B, (141-144):
12345