MICROANALYSES OF TANTALUM OXIDE-FILMS ON SI SUBSTRATE DEPOSITED BY DYNAMIC ION-BEAM MIXING

被引：0
|
作者：
HUANG, NK
WANG, DZ
机构：
[1] Institute of Nuclear Science and Technology, Sichuan University, Chengdu
来源：
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1995年 / 147卷 / 02期
关键词：
D O I：
10.1002/pssa.2211470240
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
[No abstract available]
引用
收藏
页码：K83 / K85
页数：3
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