Ion-beam reduction of the surface of tantalum higher oxide

The process of reduction of the surface of higher oxide Ta2O5 under irradiation by inert gas (Ar+) and chemically active gas (O (2) (+) ) ions with an energy of 3 keV in high vacuum is investigated by X-ray photoelectron spectroscopy at room temperature. It is found that intermediate oxide TaO2, lower oxide TaO, and metallic Ta form in the surface layers of Ta2O5 under Ar+ ion bombardment. An insignificant amount of intermediate oxide TaO2 forms in the surface layers of Ta2O5 under O (2) (+) ion bombardment. Ion-beam-induced reduction of the Ta2O5 surface is shown to depend on the type of ion and irradiation dose.