GAS PLASMA-ETCHING OF ION-IMPLANTED CHROMIUM FILMS

被引：23
|
作者：
YAMAZAKI, T
SUZUKI, Y
NAKATA, H
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1980年 / 17卷 / 06期
关键词：
D O I：
10.1116/1.570668
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：1348 / 1350
页数：3
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