GAS PLASMA-ETCHING OF ION-IMPLANTED CHROMIUM FILMS

被引：23
|
作者：
YAMAZAKI, T
SUZUKI, Y
NAKATA, H
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1980年 / 17卷 / 06期
关键词：
D O I：
10.1116/1.570668
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：1348 / 1350
页数：3
相关论文
共 50 条
  • [31] ION-IMPLANTED DIAMOND FILMS AND THEIR TRIBOLOGICAL PROPERTIES
    WU, RLC
    MIYOSHI, K
    KORENYIBOTH, AL
    GARSCADDEN, A
    BARNES, PN
    SURFACE & COATINGS TECHNOLOGY, 1993, 62 (1-3): : 589 - 594
  • [32] MAGNETOOPTICAL PROPERTIES OF ION-IMPLANTED FE FILMS
    GONDO, Y
    AOYAGI, K
    KOGURE, H
    JOURNAL OF APPLIED PHYSICS, 1991, 69 (08) : 5969 - 5971
  • [33] Raman investigation of ion-implanted ZnO films
    Zang Hang
    Wang Zhi-Guang
    Pang Li-Long
    Wei Kong-Fang
    Yao Cun-Feng
    Shen Tie-Long
    Sun Jian-Rong
    Ma Yi-Zhun
    Gou Jie
    Sheng Yan-Bin
    Zhu Ya-Bin
    ACTA PHYSICA SINICA, 2010, 59 (07) : 4831 - 4836
  • [34] STRUCTURE AND MORPHOLOGY OF ION-IMPLANTED POLYIMIDE FILMS
    YOSHIDA, K
    IWAKI, M
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1987, 19-20 : 878 - 881
  • [35] RECONSTRUCTION OF MAGNETIC STATES OF ION-IMPLANTED FILMS
    SHMATOV, GA
    FILIPPOV, BN
    SADKOV, VB
    KRYUKOV, II
    PISMA V ZHURNAL TEKHNICHESKOI FIZIKI, 1989, 15 (17): : 86 - 90
  • [36] Electronic properties of ion-implanted polymer films
    Wang, Y.Q.
    Giedd, R.E.
    Moss, M.G.
    Kaufmann, J.
    Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 1997, 127-128 : 710 - 715
  • [37] MAGNETIZATION AND COERCIVE FORCE OF ION-IMPLANTED FILMS
    CHEBOTKEVICH, LA
    VETER, VV
    ZUBAUSKAS, GA
    LIFSHITS, VG
    FIZIKA METALLOV I METALLOVEDENIE, 1988, 65 (05): : 907 - 911
  • [38] CHEMICAL ETCHING OF ION-IMPLANTED AMORPHOUS-SILICON CARBIDE
    EDMOND, JA
    PALMOUR, JW
    DAVIS, RF
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1986, 133 (03) : 650 - 652
  • [39] PLASMA-ETCHING OF ALUMINUM
    HESS, DW
    SOLID STATE TECHNOLOGY, 1981, 24 (04) : 189 - 194
  • [40] PLASMA-ETCHING OF SIPOS
    NELSON, RD
    HENNING, SM
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (06) : C241 - C241
12345