DEVELOPMENT OF A HIGH DEPOSITION RATE MACHINE BY ION-BEAM SPUTTERING

被引：2
|
作者：
HASHIMOTO, I [1 ]
ARIMATSU, K [1 ]
ISHIKAWA, Y [1 ]
TANAKA, S [1 ]
GEJYO, T [1 ]
机构：
[1] HITACHI LTD,IND PROC GRP,CHIYODA,TOKYO 104,JAPAN
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1989年 / 37-8卷
关键词：
D O I：
10.1016/0168-583X(89)90309-1
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
引用
收藏
页码：838 / 841
页数：4
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