DEVELOPMENT OF A HIGH DEPOSITION RATE MACHINE BY ION-BEAM SPUTTERING

被引：2

作者：

HASHIMOTO, I ^{[1
]}

ARIMATSU, K ^{[1
]}

ISHIKAWA, Y ^{[1
]}

TANAKA, S ^{[1
]}

GEJYO, T ^{[1
]}

机构：

[1] HITACHI LTD,IND PROC GRP,CHIYODA,TOKYO 104,JAPAN

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1989年 / 37-8卷

关键词：

D O I：

10.1016/0168-583X(89)90309-1

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：838 / 841

页数：4

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