CHANGE IN WATER-VAPOR ADSORPTION-KINETICS IN CHEMICALLY VAPOR-DEPOSITED SIO2-FILMS AFTER ION IRRADIATION

被引：0

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作者：

TSEYTLIN, GM

NOSKOV, AG

GERASIMENKO, NN

STENIN, SI

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来源：

THIN SOLID FILMS | 1988年 / 161卷

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D O I：

10.1016/0040-6090(88)90266-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

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页码：343 / 350

页数：8

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