SHALLOW DEFECT LEVELS IN NEUTRON-IRRADIATED EXTRINSIC P-TYPE SILICON

被引:0
|
作者
YOUNG, MH [1 ]
MARSH, OJ [1 ]
BARON, R [1 ]
机构
[1] HUGHES AIRCRAFT CO,RES LABS,LOS ANGELES,CA 90009
来源
关键词
D O I
暂无
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
引用
收藏
页码:1241 / 1242
页数:2
相关论文
共 50 条
  • [41] A NEW TRICLINIC DEFECT IN NEUTRON-IRRADIATED FZ-SILICON GROWN IN HYDROGEN
    WU, E
    WU, SX
    MAO, JC
    QIN, GG
    CHINESE PHYSICS, 1986, 6 (02): : 516 - 518
  • [42] PROPERTIES OF 1 MEV ELECTRON-IRRADIATED DEFECT CENTERS IN P-TYPE SILICON
    WALKER, JW
    SAH, CT
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1972, 11 (02): : 513 - &
  • [43] ON THE FORMATION OF DEFECT CLUSTERS IN NEUTRON-IRRADIATED SI
    SHI, Y
    SHEN, DX
    WU, FM
    DENG, MK
    CHENG, KJ
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1990, 50 (03): : 305 - 309
  • [44] DEFECT RECOVERY BEHAVIOR OF NEUTRON-IRRADIATED MOLYBDENUM AND TUNGSTEN OF 2 PURITY LEVELS
    LEE, F
    MATOLICH, J
    MOTEFF, J
    RADIATION EFFECTS AND DEFECTS IN SOLIDS, 1982, 60 (1-4): : 53 - 59
  • [45] STABILITY OF DEFECT STATE IN NEUTRON-IRRADIATED MOLYBDENUM
    SIKKA, VK
    MOTEFF, J
    NUCLEAR TECHNOLOGY, 1974, 22 (01) : 52 - 65
  • [46] ADMITTANCE STUDIES OF NEUTRON-IRRADIATED SILICON P+-N DIODES
    TOKUDA, Y
    USAMI, A
    JOURNAL OF APPLIED PHYSICS, 1977, 48 (04) : 1668 - 1672
  • [47] CHARACTERISTICS OF CHANGES IN MOBILITY IN NEUTRON-IRRADIATED N-TYPE SILICON
    LITVINKO, AG
    MURIN, LI
    TKACHEV, VD
    SOVIET PHYSICS SEMICONDUCTORS-USSR, 1977, 11 (08): : 933 - 935
  • [48] EFFECTS OF NEUTRON IRRADIATION IN P-TYPE SILICON
    NAKASHIMA, K
    INUISHI, Y
    JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN, 1969, 27 (02) : 397 - +
  • [49] OBSERVATION OF DEFECT ANNEALING IN NEUTRON-IRRADIATED SILICON BY SPACE-CHARGE-LIMITED CURRENT
    MAGEE, TJ
    HERMANN, AM
    DECK, RJ
    PHYSICAL REVIEW B, 1972, 5 (08): : 3364 - &
  • [50] NEW TRICLINIC DEFECT IN NEUTRON-IRRADIATED FZ-SILICON GROWN IN HYDROGEN.
    Wu En
    Wu Shuxiang
    Mao Jinchang
    Qin Guogang
    Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors, 1986, 7 (01): : 109 - 112