共 50 条
- [21] BONDING CHARACTERISTICS AND OPTICAL-PROPERTIES OF AMORPHOUS CARBON/DIAMOND FILMS DEPOSITED BY AN ELECTRON-BEAM ACTIVATED PLASMA CVD METHOD PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1995, 149 (02): : 629 - 635
- [22] Size effect of optical properties of ion-beam sputtering deposited Co films Zhenkong Kexue yu Jishu Xuebao/Vacuum Science and Technology, 2004, 24 (02): : 100 - 104
- [23] EFFECTS OF OXYGEN-CONTENT ON THE OPTICAL-PROPERTIES OF TANTALUM OXIDE-FILMS DEPOSITED BY ION-BEAM SPUTTERING APPLIED OPTICS, 1985, 24 (04): : 490 - 495
- [28] Ion Beam Induced Effects in RF Plasma Chemical Vapor Deposition Deposited Hydrogenated Amorphous Carbon Thin Films Narayanan, K.L., 1600, Japan Society of Applied Physics (42):
- [29] Ion beam induced effects in RF plasma chemical vapor deposition deposited hydrogenated amorphous carbon thin films JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 2003, 42 (8B): : L1021 - L1024