Ion Beam Induced Effects in RF Plasma Chemical Vapor Deposition Deposited Hydrogenated Amorphous Carbon Thin Films

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[1] Narayanan, Kannan L.
[2] Soga, Tetsuo
[3] Oshita, Yoshio
[4] Yamaguchi, Masafumi
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Narayanan, K.L. | 1600年 / Japan Society of Applied Physics卷 / 42期
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