OPTICAL-PROPERTIES OF RF PLASMA DEPOSITED AND ION-BEAM DEPOSITED AMORPHOUS-CARBON FILMS

被引:0
|
作者
MATHINE, D [1 ]
KHAN, AA [1 ]
BUABBUD, G [1 ]
WOOLLAM, JA [1 ]
BANKS, BA [1 ]
DOMITZ, S [1 ]
机构
[1] UNIV NEBRASKA,DEPT ELECT ENGN,LINCOLN,NE 68588
关键词
D O I
10.1016/0008-6223(84)90364-6
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
引用
收藏
页码:220 / 220
页数:1
相关论文
共 50 条
  • [41] Optical properties of hydrogenated amorphous carbon films deposited from glow discharge plasma
    Yastrebov, SG
    Allen, T
    Ivanov-Omskii, VI
    Chan, V
    Zukotynski, S
    TECHNICAL PHYSICS LETTERS, 2003, 29 (10) : 858 - 861
  • [42] Structural and optical properties of plasma-deposited amorphous hydrogenated oxygenated carbon films
    Durrant, SF
    deOliveira, RT
    Castro, SGC
    BolivarMarinez, LE
    Galvao, DS
    deMoraes, MAB
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1997, 15 (03): : 1334 - 1339
  • [43] OPTICAL-PROPERTIES OF THIN AMORPHOUS-SILICON AND AMORPHOUS HYDROGENATED SILICON FILMS PRODUCED BY ION-BEAM TECHNIQUES
    MARTIN, PJ
    NETTERFIELD, RP
    SAINTY, WG
    MCKENZIE, DR
    THIN SOLID FILMS, 1983, 100 (02) : 141 - 147
  • [44] PROPERTIES OF TETRAHEDRAL AMORPHOUS-CARBON FILMS DEPOSITED IN A FILTERED CATHODIC ARC IN THE PRESENCE OF HYDROGEN
    DAVIS, CA
    VEERASAMY, VS
    AMARATUNGA, GAJ
    MILNE, WI
    MCKENZIE, DR
    PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES, 1994, 69 (06): : 1121 - 1131
  • [45] EFFECT OF ION-BEAM ASSISTANCE ON THE MICROSTRUCTURE OF NONHYDROGENATED AMORPHOUS-CARBON
    ROSSI, F
    ANDRE, B
    VANVEEN, A
    MIJNARENDS, PE
    SCHUT, H
    DELPLANCKE, MP
    GISSLER, W
    HAUPT, J
    LUCAZEAU, G
    ABELLO, L
    JOURNAL OF APPLIED PHYSICS, 1994, 75 (06) : 3121 - 3129
  • [46] ION-BEAM DEPOSITED EPITAXIAL THIN SILICON FILMS
    ORRMANROSSITER, KG
    ALBAYATI, AH
    ARMOUR, DG
    DONNELLY, SE
    VANDENBERG, JA
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1991, 59 : 197 - 202
  • [47] OPTICAL-PROPERTIES OF INSB FILMS DEPOSITED ON SAPPHIRE SUBSTRATES BY RF-SPUTTERING
    MIYAZAKI, T
    ADACHI, S
    JOURNAL OF APPLIED PHYSICS, 1991, 70 (03) : 1672 - 1677
  • [48] ION-BEAM SPUTTER DEPOSITED ZINC TELLURIDE FILMS
    GULINO, DA
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (03): : 509 - 513
  • [49] ION-BEAM INDUCED EPITAXY OF DEPOSITED AMORPHOUS SI AND SI-GE FILMS
    YU, AJ
    MAYER, JW
    EAGLESHAM, DJ
    POATE, JM
    APPLIED PHYSICS LETTERS, 1989, 54 (23) : 2342 - 2344
  • [50] OPTICAL-PROPERTIES OF ION ASSISTED DEPOSITED ZIRCONIA THIN-FILMS
    KRISHNA, MG
    RAO, KN
    MOHAN, S
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1992, 10 (06): : 3451 - 3455