ACTIVATED REACTIVE EVAPORATION

被引：0
|
作者：
EBERT, J
机构：
来源：
PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS | 1982年 / 325卷
关键词：
D O I：
暂无
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
引用
收藏
页码：29 / 38
页数：10
相关论文
共 50 条
  • [21] ACTIVATED REACTIVE EVAPORATION OF HYDROGENATED AMORPHOUS-SILICON NITRIDE
    SHUFFLEBOTHAM, PK
    WHITE, JF
    CARD, HC
    KAO, KC
    APPLIED PHYSICS LETTERS, 1986, 49 (11) : 651 - 653
  • [22] PREPARATION OF PBTIO3 FILMS BY ACTIVATED REACTIVE EVAPORATION (ARE)
    OKAMURA, T
    ODA, K
    TAKADA, J
    OSAKA, A
    MIURA, Y
    TERASHIMA, T
    BANDO, Y
    NIPPON SERAMIKKUSU KYOKAI GAKUJUTSU RONBUNSHI-JOURNAL OF THE CERAMIC SOCIETY OF JAPAN, 1990, 98 (08): : 749 - 753
  • [23] ACTIVATED REACTIVE EVAPORATION PROCESS FOR HIGH RATE DEPOSITION OF COMPOUNDS
    BUNSHAH, RF
    RAGHURAM, AC
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (06): : 1385 - &
  • [24] CORROSION PROPERTIES OF TIC FILMS PREPARED BY ACTIVATED REACTIVE EVAPORATION
    BEVERSKOG, B
    CARLSSON, JO
    BAUER, AD
    DESHPANDEY, CV
    DOERR, HJ
    BUNSHAH, RF
    OBRIEN, BP
    SURFACE & COATINGS TECHNOLOGY, 1990, 41 (02): : 221 - 229
  • [25] SNO2 FILMS PREPARED BY ACTIVATED REACTIVE EVAPORATION
    RANDHAWA, HS
    MATTHEWS, MD
    BUNSHAH, RF
    THIN SOLID FILMS, 1981, 83 (02) : 267 - 271
  • [26] PHYSICAL BEHAVIOR OF CDO FILMS PREPARED BY ACTIVATED REACTIVE EVAPORATION
    SRAVANI, C
    REDDY, KTR
    REDDY, PJ
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1991, 6 (10) : 1036 - 1038
  • [27] PREPARATION OF CUXS THIN-FILMS BY ACTIVATED REACTIVE EVAPORATION TECHNIQUE
    RANDHAWA, HS
    BUNSHAH, RF
    BROCK, DG
    BASOL, BM
    STAFSUDD, OM
    SOLAR ENERGY MATERIALS, 1982, 6 (04): : 445 - 453
  • [28] STRUCTURE OF TIC-NI COATINGS SYNTHESIZED BY ACTIVATED REACTIVE EVAPORATION
    SARIN, VK
    BUNSHAH, RF
    NIMMAGADDA, R
    THIN SOLID FILMS, 1977, 40 (JAN) : 183 - 188
  • [29] Optical and electrical properties of ZnO films deposited by activated reactive evaporation
    Yuvaraj, D.
    Rao, K. Narasimha
    VACUUM, 2008, 82 (11) : 1274 - 1279
  • [30] Composition, structure and hardness of ZrCx films formed by activated reactive evaporation
    Arai, Takashi, 1600, (54):
12345