ACTIVATED REACTIVE EVAPORATION PROCESS FOR HIGH RATE DEPOSITION OF COMPOUNDS

被引：192
|
作者：
BUNSHAH, RF
RAGHURAM, AC
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1972年 / 9卷 / 06期
关键词：
D O I：
10.1116/1.1317045
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：1385 / &
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