ABSOLUTE 2-D SUB-MICRON METROLOGY FOR ELECTRON-BEAM LITHOGRAPHY

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作者：

RAUGH, MR

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PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS | 1984年 / 480卷

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O43 [光学];

学科分类号：

070207 ; 0803 ;

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页码：145 / 163

页数：19

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