ABSOLUTE 2-D SUB-MICRON METROLOGY FOR ELECTRON-BEAM LITHOGRAPHY

被引：0
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作者：
RAUGH, MR
机构：
来源：
PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS | 1984年 / 480卷
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中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
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页码：145 / 163
页数：19
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