CHARACTERIZATION OF RADIO-FREQUENCY DEPOSITED THIN CARBON-FILMS

被引:5
|
作者
SIPERKO, LM
BRENNA, JT
CREASY, WR
机构
[1] IBM Systems Technology Division, Endicott, New York
关键词
D O I
10.1116/1.576870
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Thin carbon films (20–50 nm) synthesized from an acetylene rf plasma were characterized by micro-Raman spectroscopy, Rutherford backscattering spectroscopy (RBS), forward recoil spectroscopy (FRES), and laser-ablation/Fourier transform mass spectrometry (FTMS). The films were found to be free of any metal impurities by RBS and FTMS. FRES indicated low hydrogen content. Pronounced changes in the Raman spectra of films baked in nitrogen suggest structural transformations. The films underwent a transition from amorphous to graphitic-like structures after a 24 h bake at 400 °C. Comparison of the Raman spectra of the rf-deposited films to those of control films formed from graphite indicated subtle structural differences. © 1990, American Vacuum Society. All rights reserved.
引用
收藏
页码:1533 / 1537
页数:5
相关论文
共 50 条
  • [41] Thin films of amorphous germanium-carbon alloy prepared by radio-frequency magnetron sputtering
    Maruyama, T
    Akagi, H
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1996, 143 (12) : 4087 - 4089
  • [42] Thin films of amorphous silicon-carbon alloy prepared by radio-frequency magnetron sputtering
    Maruyama, T
    Sudoh, H
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2001, 148 (12) : G717 - G720
  • [43] Thin films of amorphous germanium-carbon alloy prepared by radio-frequency magnetron sputtering
    Kyoto Univ, Kyoto, Japan
    J Electrochem Soc, 12 (4087-4089):
  • [44] Physical Properties of Nano-Structured Zinc Oxide Thin Films Deposited by Radio-Frequency Magnetron Sputtering
    Saurdi, I.
    Mamat, M. H.
    Rusop, M.
    NANOSYNTHESIS AND NANODEVICE, 2013, 667 : 495 - 500
  • [45] Molybdenum thin films with low resistivity and superior adhesion deposited by radio-frequency magnetron sputtering at elevated temperature
    Dai, Xinyi
    Zhou, Aijun
    Feng, Lidong
    Wang, Ying
    Xu, Jin
    Li, Jingze
    THIN SOLID FILMS, 2014, 567 : 64 - 71
  • [46] PROPERTIES OF LASER PLASMA DEPOSITED CARBON-FILMS
    RICHTER, A
    MUHLING, I
    KLOSE, M
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1988, 107 (01) : 128 - 131
  • [47] Structural and microstructural characterization of nanocrystalline silicon thin films obtained by radio-frequency magnetron sputtering
    Morales, M
    Leconte, Y
    Rizk, R
    Chateigner, D
    JOURNAL OF APPLIED PHYSICS, 2005, 97 (03)
  • [48] Cathodoluminescence study of gadolinium-doped yttrium oxide thin films deposited by radio-frequency magnetron sputtering
    Fowlkes, JD
    Rack, PD
    Bansal, R
    Fitz-Gerald, JM
    NEW APPLICATIONS FOR WIDE-BANDGAP SEMICONDUCTORS, 2003, 764 : 419 - 424
  • [49] Compositional and structural properties of TiO2-xNx thin films deposited by radio-frequency magnetron sputtering
    Key Laboratory of Excited State Processes, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China
    不详
    不详
    Chin. Phys. Lett., 2006, 3 (682-685):
  • [50] MICROSTRUCTURE OF VAPOR-DEPOSITED CARBON-FILMS
    SHIM, HS
    AGARWAL, NK
    HAUBOLD, AD
    CARBON, 1977, 15 (06) : 434 - 434