CHARACTERIZATION OF RADIO-FREQUENCY DEPOSITED THIN CARBON-FILMS

被引：5
|
作者：
SIPERKO, LM
BRENNA, JT
CREASY, WR
机构：
[1] IBM Systems Technology Division, Endicott, New York
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1990年 / 8卷 / 03期
关键词：
D O I：
10.1116/1.576870
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Thin carbon films (20–50 nm) synthesized from an acetylene rf plasma were characterized by micro-Raman spectroscopy, Rutherford backscattering spectroscopy (RBS), forward recoil spectroscopy (FRES), and laser-ablation/Fourier transform mass spectrometry (FTMS). The films were found to be free of any metal impurities by RBS and FTMS. FRES indicated low hydrogen content. Pronounced changes in the Raman spectra of films baked in nitrogen suggest structural transformations. The films underwent a transition from amorphous to graphitic-like structures after a 24 h bake at 400 °C. Comparison of the Raman spectra of the rf-deposited films to those of control films formed from graphite indicated subtle structural differences. © 1990, American Vacuum Society. All rights reserved.
引用
收藏
页码：1533 / 1537
页数：5
相关论文
共 50 条
  • [31] Effects of process parameters on the LaNiO3 thin films deposited by radio-frequency magnetron sputtering
    Zhang, Congchun
    Hou, Jie
    Rao, Rui
    Yang, Chunsheng
    Ding, Guifu
    THIN SOLID FILMS, 2009, 517 (24) : 6837 - 6840
  • [32] Vanadium oxide thin films deposited on indium tin oxide glass by radio-frequency magnetron sputtering
    Wang, XJ
    Fei, YJ
    Xiong, YY
    Nie, YX
    Feng, KA
    Li, LD
    CHINESE PHYSICS, 2002, 11 (07): : 737 - 740
  • [33] MICROSTRUCTURE IN THIN CARBON-FILMS
    GONZALEZHERNANDEZ, J
    VAZQUEZLOPEZ, C
    ZUNIGASEGUNDO, A
    CHAO, BS
    SOLID STATE COMMUNICATIONS, 1993, 87 (01) : 23 - 26
  • [34] Tetrahedral and trigonal carbon atom hybridization in thin amorphous carbon films synthesized by radio-frequency sputtering
    Wan, D.
    Komvopoulos, K.
    JOURNAL OF PHYSICAL CHEMISTRY C, 2007, 111 (27): : 9891 - 9896
  • [35] Investigation on AZO Films Deposited by Radio-frequency Reactive Magnetron Sputtering
    Kang, Cheng-long
    Deng, Jin-xiang
    Cui, Min
    Man, Chao
    Kong, Le
    Yang, Ping
    CHINA FUNCTIONAL MATERIALS TECHNOLOGY AND INDUSTRY FORUM, 2013, 320 : 35 - 39
  • [36] PHYSICOCHEMICAL PROPERTIES IN TUNGSTEN FILMS DEPOSITED BY RADIO-FREQUENCY MAGNETRON SPUTTERING
    COLLOT, P
    AGIUS, B
    ESTRACHE, P
    HUGON, MC
    FROMENT, M
    BESSOT, J
    CRASSIN, Y
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (04): : 2319 - 2325
  • [37] Characterization of Eu-doped SnO2 thin films deposited by radio-frequency sputtering for a transparent conductive phosphor layer
    Park, DH
    Cho, YH
    Do, YR
    Ahn, BT
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2006, 153 (04) : H63 - H67
  • [38] Preparation and characterization of the defect–conductivity relationship of Ga-doped ZnO thin films deposited by nonreactive radio-frequency–magnetron sputtering
    M. Lalanne
    J. M. Soon
    A. Barnabé
    L. Presmanes
    I. Pasquet
    Ph. Tailhades
    Journal of Materials Research, 2010, 25 : 2407 - 2414
  • [39] Preparation and characterization of nanostructured silver thin films deposited by radio frequency magnetron sputtering
    Xiong, YQ
    Wu, H
    Guo, Y
    Sun, Y
    Yang, DQ
    Da, D
    THIN SOLID FILMS, 2000, 375 (1-2) : 300 - 303
  • [40] AGING PROCESSES IN THIN RADIO-FREQUENCY SPUTTERED ZINC FILMS
    TELLIER, C
    THIN SOLID FILMS, 1978, 51 (03) : 327 - 334
12345