CHARACTERIZATION OF RADIO-FREQUENCY DEPOSITED THIN CARBON-FILMS

被引：5
|
作者：
SIPERKO, LM
BRENNA, JT
CREASY, WR
机构：
[1] IBM Systems Technology Division, Endicott, New York
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1990年 / 8卷 / 03期
关键词：
D O I：
10.1116/1.576870
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Thin carbon films (20–50 nm) synthesized from an acetylene rf plasma were characterized by micro-Raman spectroscopy, Rutherford backscattering spectroscopy (RBS), forward recoil spectroscopy (FRES), and laser-ablation/Fourier transform mass spectrometry (FTMS). The films were found to be free of any metal impurities by RBS and FTMS. FRES indicated low hydrogen content. Pronounced changes in the Raman spectra of films baked in nitrogen suggest structural transformations. The films underwent a transition from amorphous to graphitic-like structures after a 24 h bake at 400 °C. Comparison of the Raman spectra of the rf-deposited films to those of control films formed from graphite indicated subtle structural differences. © 1990, American Vacuum Society. All rights reserved.
引用
收藏
页码：1533 / 1537
页数：5
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