LASER-CHEMICAL VAPOR-DEPOSITION FOR MICROELECTRONICS

The laser microchemical direct-write process is a powerful method to fabricate microstructures required for drawing interconnection networks in customised circuits and remodelling prototype circuits. The laser microchemical direct-write technique is presented by reviewing some laser-induced chemical reactions involved in the deposition of materials used in the microelectronics field. Investigation of the deposition of metals and silicon micrometer-size lines or dots using a CW argon-ion laser operating at wavelengths around 0.5 mu m, is described. The growth kinetics, morphology and electrical resistivity of the deposits are studied in detail at various scanning speeds of the laser spot, laser-beam powers and reactant gas pressures. Several photon fluxes have been used to emphasise any photolytic effect. Investigations of the kinetics of the chemical reactions allow us to propose reaction mechanisms for the decomposition of the reactive molecules used. On the basis of reported results, the use of the laser direct-write process as a tool for restructuring integrated circuits is presented.