KINETICS OF LASER CHEMICAL VAPOR-DEPOSITION OF TI

被引：0

|

作者：

AZER, M ^{[1
]}

CHOU, WB ^{[1
]}

MAZUMDER, J ^{[1
]}

机构：

[1] UNIV ILLINOIS,DEPT MECH & IND ENGN,LASER AIDED MAT PROC LAB,URBANA,IL 61801

来源：

JOURNAL OF METALS | 1988年 / 40卷 / 07期

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中图分类号：

TF [冶金工业];

学科分类号：

0806 ;

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页码：A79 / A79

页数：1

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