KINETICS OF CHEMICAL VAPOR-DEPOSITION

被引:7
|
作者
SUBRAHMANYAM, J [1 ]
LAHIRI, AK [1 ]
ABRAHAM, KP [1 ]
机构
[1] INDIAN INST SCI,DEPT MET,BANGALORE 560012,INDIA
关键词
D O I
10.1149/1.2129905
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
引用
收藏
页码:1394 / 1399
页数:6
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