TEM STUDY OF INTERDIFFUSION AND INTERFACES IN MO/PD/SI THIN-FILMS

被引：4

|

作者：

SINGH, RN

KOCH, EF

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1986年 / 133卷 / 06期

关键词：

D O I：

10.1149/1.2108817

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

收藏

页码：1191 / 1195

页数：5

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