TEM STUDY OF INTERDIFFUSION AND INTERFACES IN MO/PD/SI THIN-FILMS

被引:4
|
作者
SINGH, RN
KOCH, EF
机构
关键词
D O I
10.1149/1.2108817
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
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页码:1191 / 1195
页数:5
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