High Aspect Ratio Machining of Nanocarbon Materials by Reactive Ion Etching

被引：0
|
作者：
Atsuko Sekiguchi
Don N. Futaba
Takeo Yamada
Kenji Hata
机构：
[1] National Institute of Advanced Industrial Science and Technology (AIST),CNT
来源：
MRS Advances | 2017年 / 2卷 / 1期
关键词：
D O I：
10.1557/adv.2017.93
中图分类号：
学科分类号：
摘要：
We demonstrate anisotropic, vertical deep etching of graphite and densely packed carbon nanotube (CNT) thick layer beyond the micrometer scale, which representing the first step toward nanocarbon bulk micromachining. This micromachining process is compatible with standard lithography and therefore allows the fabrication of graphite and CNT architectures with 1 μm lateral resolution and up to 10 μm scale depth.
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页码：9 / 14
页数：5
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