Recent progress in the repair accuracy of the focused-ion-beam mask repair system

被引：1
|
作者：
Aita, K [1 ]
Yasaka, A [1 ]
Kitamura, T [1 ]
Matsumura, H [1 ]
Satoh, Y [1 ]
Nakamura, H [1 ]
Fujikawa, J [1 ]
Tsuchiya, K [1 ]
Noguchi, S [1 ]
机构：
[1] SEIKO INSTRUMENTS INC,SCI INSTRUMENTS DIV,OYAMA,SHIZUOKA 41013,JAPAN
来源：
PHOTOMASK AND X-RAY MASK TECHNOLOGY III | 1996年 / 2793卷
关键词：
D O I：
10.1117/12.245221
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
引用
收藏
页码：324 / 335
页数：12
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