Local Droplet Etching - Nanoholes, Quantum Dots, And Air-Gap Heterostructures

被引：0

作者：

Heyn, Ch ^{[1
]}

Sonnenberg, D. ^{[1
]}

Graf, A. ^{[1
]}

Kerbst, J. ^{[1
]}

Stemmann, A. ^{[1
]}

Hansen, W. ^{[1
]}

机构：

[1] Univ Hamburg, Inst Appl Phys, D-20355 Hamburg, Germany

来源：

7TH INTERNATIONAL CONFERENCE ON LOW DIMENSIONAL STRUCTURES AND DEVICES (LDSD 2011) | 2014年 / 1598卷

关键词：

Local droplet etching; quantum dot; air-gap heterostructure;

D O I：

10.1063/1.4878285

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Local droplet etching (LDE) allows the self-organized generation of nanoholes in semiconductor surfaces and is fully compatible with molecular beam epitaxy (MBE). The influence of the process parameters as well as of droplet and substrate materials on the LDE nanohole morphology is discussed. Furthermore, recent applications of LDE, the fabrication of quantum dots by hole filling and the creation of air-gap heterostructures are addressed.

引用

页码：91 / 94

页数：4

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