Ti Capping Layer Effects in Microstructure and Magnetic Properties of Sputter-Deposited FePt Thin Film

被引：0
|
作者：
Xu, Jialing [1 ]
Jia, Liyun [1 ,2 ]
Li, Chenpu [1 ]
Wang, Haosen [1 ]
Ma, Li [2 ]
Sun, Huiyuan [2 ]
Hou, Denglu [2 ]
机构：
[1] Hebei Inst Architecture Civil Engn, Dept Math & Phys, Zhangjiakou 075000, Peoples R China
[2] Hebei Normal Univ, Dept Phys, Hebei Adv Thin Films Lab, Shijiazhuang 050024, Hebei, Peoples R China
来源：
JOURNAL OF SUPERCONDUCTIVITY AND NOVEL MAGNETISM | 2018年 / 31卷 / 07期
基金：
中国国家自然科学基金;
关键词：
L1(0)-ordered structure; Magnetron sputtering; Ti capping layer; PERPENDICULAR RECORDING MEDIA; TEXTURE; FIELD;
D O I：
10.1007/s10948-017-4429-2
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Ti/FePt/Fe nano-thin films were fabricated by a DC facing-target magnetron sputtering method onto glass substrates at room temperature and were subsequently annealed in situ in vacuum. The impacts of the Ti capping layer on microstructural and magnetic properties of the FePt films were investigated in detail. X-ray diffraction (XRD) patterns demonstrate that the film is deposited onto glass substrates and the addition of a Ti layer forms ternary TiFePt, and binary PtTi and FeTi alloys. The results reveal refined granularity, decreased roughness, and enhanced coercivity and degree of squareness after the introduction of a Ti capping layer.
引用
收藏
页码：2207 / 2210
页数：4
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