Ti Capping Layer Effects in Microstructure and Magnetic Properties of Sputter-Deposited FePt Thin Film

Ti/FePt/Fe nano-thin films were fabricated by a DC facing-target magnetron sputtering method onto glass substrates at room temperature and were subsequently annealed in situ in vacuum. The impacts of the Ti capping layer on microstructural and magnetic properties of the FePt films were investigated in detail. X-ray diffraction (XRD) patterns demonstrate that the film is deposited onto glass substrates and the addition of a Ti layer forms ternary TiFePt, and binary PtTi and FeTi alloys. The results reveal refined granularity, decreased roughness, and enhanced coercivity and degree of squareness after the introduction of a Ti capping layer.